Display & Touch Panel 1 페이지

본문 바로가기
Applications and Technology
Ellipso Technology
Display & Touch Panel
  HOME > Applications and Technology > Display & Touch Panel
Analysis of Films of Display & Touch Panel - A Few Examples (Ref: Ellipso Technology)
 

1. SiO2

>> Shortcut >>

2. Silica Nano particle

>> Shortcut >>

3. AgOx

>> Shortcut >>

4. PR

>> Shortcut >>

5. SiNx

>> Shortcut >>

6. ITO

>> Shortcut >>

7. Acrylic Resin

>> Shortcut >>

8. AF Coating

>> Shortcut >>

9. PAC(Photo Active Compound)

>> Shortcut >>

10. Au

>> Shortcut >>

11. PS

>> Shortcut >>

12. TIPS-PEN

>> Shortcut >>

13. Polymer

>> Shortcut >>

14. TiOC

>> Shortcut >>

15. CuNx

>> Shortcut >>

1. SiO2

[TOP]
  1-1. SiO2/HardCoating/Primer on PET
 
 
Thickness of Film (From Top) :
     SiO2 = 18.29 nm
     Hard Coating (93.2 %) = 3258.8 nm
     Primer = 63.33 nm
Substrate = PET
 
  1-2. SiO2 on Cu
 
Thickness, SiO2: 343.466 nm
R.I. Dispersion of SiO2
Substrate : Cu

  1-3. SiO2/GI on Cu
 
Thickness, SiO2: 343.466 nm
                     GI   : 38.527nm
R.I. Dispersion of SiO2
Substrate : Cu

2. Silica Nano Particle

[TOP]
  2-1. Silica Nano Particle on PET
 
 
R.I. Dispersion of SiO2(53.1%) Main Layer
Substrate = PET
Layers (From Top) :
     SiO2(33.7%)+void(66.3%) = 38.1 nm
     SiO2(53.1%)+void(46.9%) = 52.7 nm
     SiO2(101.8%)+void(-1.8%) = 35.4 nm
  Silica Nano Particle on top of a uniform 30-nm-thick SiO2, is expressed as a composite two-layer structure, each consisted of SiO2 and void.
  2-2. Silica Nano Particle on Hard Coated PET
 
 
R.I. Dispersion of SiO2(52.4%) Main Layer
Substrate = PET
Layers (From Top) :
     SiO2(26.8%)+void(73.2%) = 34.4 nm
     SiO2(52.4%)+void(47.6%) = 67.8 nm
     SiO2(101%)                          = 36.7 nm
     HC                                         = 7993.6 nm
     Primer                                    = 86 nm
  Silica Nano Particle on top of a uniform 30-nm-thick SiO2, is expressed as a composite two-layer structure, each consisted of SiO2 and void. The thickness of Hard Coating and that of primer are also determined.

3. AgOx

[TOP]
  3-1. AgOx on c-Si
 
Thickness, AgOx: 23.347 nm
R.I. Dispersion of AgOx
Substrate : Crystalline Silicon

  3-2. AgOx on c-Si
 
Thickness, AgOx: 19.789 nm
R.I. Dispersion of AgOx
Substrate : Crystalline Silicon

  3-3. AgOx on c-Si
 
Thickness, AgOx: 19.739 nm
R.I. Dispersion of AgOx
Substrate : Crystalline Silicon

4. PR

[TOP]
  4-1. PR on Al2O3
 
 
PR Thickness : 1784.29 nm
Substrate : Al2O3
R.I Dispersion of PR
  4-2. PR/Gan on Al2O3
 
 
Thickness of Film (From Top) :
     PR = 2482.69 nm
     GaN (91.4 %) + PR (8.6 %) = 6198.79 nm
     GaN (77.8 %) + void (22.2 %) = 69.09 nm
Substrate : Al2O3
 
  4-3. PR on c-Si
 
Thickness, PR : 1423.475 nm
R.I. Dispersion of PR
Substrate : Crystalline Silicon

5. SiNx

[TOP]
  5-1. SiNx on Glass
 
SiNx Thickness : 372.74 nm
R.I. (@633 nm) : 1.8823
Substrate : Glass
  5-1. SiNx on Glass
 
Thickness SiNx : 468.294 nm
R.I. Dispersion of SiNx
Substrate : EagleXG Glass
 
  The complex refractive index dispersion of SiNx(left) and the refractive index dispersion of EgleXG-Glass(right, red line). The refractive index of soda-lime glass(right, black line) is compared with that of EgleXG Glass.

6. ITO

[TOP]
  6-1. ITO on glass
 
 
  6-2. a-ITO on Glass
 
Thickness a-ITO : 76.85 nm
R.I. Dispersion of a-ITO
Substrate : EagleXG Glass
   
 
R.I. Dispersion of ITO & a-ITO
 
  6-3. ITO on Glass
 
 
ITO Thickness 63.26 nm
R.I. Dispersion of ITO
Substrate: Crystalline Silicon
  6-4. ITO on Sapphire
 
ITO Thickness : 160.66 nm
R.I. Dispersion of ITO
Substrate : Al2O3
 
  6-5. ITO on c-Si, ITO on PET : The Complex Refractive Index Dispersion
 

From the complex refractive index of ITO, one can recognize that density and/or light absorption of ITO film depends on the substrate upon which it is coated.

ITO film coated on c-Si wafer is denser than that on PET substrate. Further, ITO film coated on c-Si wafer is less light-absorbing than that coated on PET.

Thus ITO film on c-Si wafer is superior to that on PET.

7. Acrylic Resin

[TOP]
  7-1. Acrylic Resin on Glass
 
Thickness Acrylic resin :
                                     2128.73 nm
R.I. Dispersion of Acrylic Resin
Substrate : EagleXG Glass
 

8. AF Coating

[TOP]
  8-1. AF Coating on Glass
 
AF Coating(24.7 %) + void(75.3 %) = 14.78 nm
R.I. Dispersion of AF Coating
Substrate : Glass
 

9. PAC(Photo Active Compound)

[TOP]
  9-1. PAC(Photo Active Compound) on Normal TFT
 
 
R.I. Dispersion of PAC
Substrate = Glass
Layers (From Top) :
     PAC(87.576+void(21.4%) = 25.146 nm
     SiN(56.7%)+void(43.3%) = 1970.908 nm
     SiN(50.9%)+void(49.1%) = 269.249 nm
     TFT(35.5%)+void(64.5%) = 180.532 nm
     TFT(52.2%)+void(47.8%) = 54.827 nm
     TFT(66.7%)+void(33.3%) = 86.526 nm
  9-2. PAC(Photo Active Compound) on Retina TFT
 
 
R.I. Dispersion of PAC
Substrate = Glass
Layers (From Top) :
     PAC(100%)                         = 2177.246 nm
     PAC(86.4%)+void(13.6%) = 48.9 nm
     TFT(42.7%)+void(57.3%) = 47.313 nm
     TFT(67.6%)+void(52.4%) = 54.652 nm
     TFT(44.5%)+void(55.5%) = 62.867 nm

10. Au

[TOP]
  10-1. Au on Glass
 
Thickness, Au : 40.182 nm
R.I. Dispersion of Au
Substrate : Glass

11. PS

[TOP]
  11-1. PS/Au on Glass
 
Thickness, PS : 15.797 nm
                    Au : 51.639 nm
R.I. Dispersion of PS
Substrate : Glass

12. TIPS-PEN

[TOP]
  12-1. TIPS-PEN/Au on Glass
 
Thickness, TIPS-PEN : 150.944 nm
R.I. Dispersion of TIPS-PEN
Substrate : Glass

  12-2. TIPS-PEN/Au on c-Si
 
Thickness, TIPS-PEN : 144.407 nm
R.I. Dispersion of TIPS-PEN
Substrate : c-Si

13. Polymer

[TOP]
  13-1. Polymer on Glass
 
Thickness, Polymer : 97.582 nm
R.I. Dispersion of Polymer
Substrate : Glass

14. TiOC

[TOP]
  14-1. TiOC on c-Si
 
Thickness, TiOC : 106.653 nm
R.I. Dispersion of TiOC
Substrate : c-Si

15. CuNx

[TOP]
  15-1. CuNx on c-Si
 
Thickness, CuNx : 28.058 nm
R.I. Dispersion of CuNx
Substrate : c-Si

  15-2. CuNx on c-Si
 
Thickness, CuNx : 82.097 nm
R.I. Dispersion of CuNx
Substrate : c-Si