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Applications and Technology
Ellipso Technology
Optical Films and Films on PET
  HOME > Applications and Technology > Optical Films and Films on PET
Analysis of Optical Thin Films and Films on PET – A Few Examples (Ref: Ellipso Technology)
 

1. Reflectivity of Camera Phone Lens : Effect of ARC

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2. MgO-LiNbO3 / Epoxy on LiNbO3

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3. TiO2

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4. TiNx

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5. Cr

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6. Nio

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7. Primer

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8. Hard Coating

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9. LR/HR

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10. Low RI/High RI

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11. Depth Profile of MgF2 AR Coating

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12. Multi-Layers

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13. Color Filters (Red, Green, Blue)

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14. PHPS

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15. Poly Siloxane

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16. CN

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17. BN

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18. BCN

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1. Reflectivity of Camera Phone Lens : Effect of ARC

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  Reflectivities of camera phone lens are compared. The reflection spectra of lenses before they are anti-reflection coated(upper middle), and after they are anti-reflection coated(upper right) are shown.

Thickness of ARC film is 58.4 nm. Reflectivity decreases from ~10 % to 2~4 % after AR coating. Backside reflection from the opposite side of lens is included.

2. MgO-LiNbO3 / Epoxy on LiNbO3

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Thickness
     MgO-LiNbO3: 5995.43 nm
     Epoxy : 382.41 nm
R.I.(@633 nm)
     MgO-LiNbO3 : 2.206
     Epoxy : 1.7251
Substrate : LiNbO3

3. TiO2

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  3-1. Ag Doped TiO2 on Glass
 
Thickness : 157.65 nm
Substrate : Glass
R.I. Dispersion

  3-2. Co Doped TiO2 on Glass
 
Thickness : 165.65 nm
Substrate : Glass
R.I. Dispersion

4. TiNx

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  4-1. TiNx on Glass
 
Thickness : TiNx 10.363 nm
Substrate : Glass
R.I. Dispersion of TiNx

5. Cr

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  5-1.Cr on Glass
 
Thickness : Cr 32.091 nm
Substrate : Glass
R.I. Dispersion of Cr

6. NiO

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  6-1. NiO on c-Si
 
Thickness : NiO 35.522 nm
Substrate : Crystalline Silicon
R.I. Dispersion of NiO

7. Primer

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  7-1. Primer on PET(Mitsubishi)
 
Thickness : Primer 80.847 nm
Substrate : PET(Mitsubishi)
R.I. Dispersion of Primer

  7-2. Primer on PET(Toyobo)
 
Thickness : Primer 78.857 nm
Substrate : PET(Toyobo)
R.I. Dispersion of Primer

  7-3. Primer on PET(Toyobo_low-Oligomer)
 
Thickness : Primer 60.209 nm
Substrate : PET(Toyobo_Low-Oligomer)
R.I. Dispersion of Primer

8. Hard Coating

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  8-1. Hard Coating/Primer on PET
 
 
Thickness of Film (From Top) :
     Hard Coating = 963.42 nm
     Primer = 58.38 nm
Substrate = PET
 

9. LR/HR

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  9-1. LR/HR on PET
 
  λ-min analysis technique and m-FFT analysis technique are applied simultaneously to obtain thickness of LR and that of HR, respectively, at the same time. LR(~100 nm) and HR(~μm) are coated on PET.
 
LR Thickness      113.0 nm
HR Thickness     1750.0 nm
 

10. Low RI/High RI

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  10-1. Low RI/High RI/Hardcoating/Primer on PET
 
Thickness : Low RI 16.336 nm
                     High RI 54.397 nm
                     Hardcoating 1721.137 nm
                     Primer 100 nm
Substrate : PET
R.I. Dispersion of Low RI / High RI

11. Depth Profile of MgF2 AR Coating

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Thickness of Film (From Top)
      P(Protection Layer)-Layer = 33.63 nm
     MgF2(55 %) + void(45 %) = 61.83 nm
     MgF2 (125 %) + void(-25 %) = 1109.9 nm
     Substrate : PET(94.6 %) + void(5.6 %)
 

12. Multi-Layers

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  12-1. AF/SiO2/SiN/SiO2/SiN/SiO2/SiN on Glass
 
Layers(From Top) : SiO2 (17.4%) + void(82.6%)       11.667 nm
                                   SiO2 (100%)                                  56.503 nm
                                   SiN (92.6%) + void(7.4%)           74.035 nm
                                   SiO2 (100%)                                  21.470 nm
                                   SiN (88.7%) + void(11.3%)         42.155 nm
                                   SiO2 (100%)                                  69.977 nm
                                   SiN (81.1%) + void(18.9%)         135.159 nm
Substrate : Glass
R.I. Dispersion of SiO2(17.4%) AF Layer

  12-2. SiO2/TiO2/SiO2/TiO2/SiO2/TiO2/SiO2/TiO2/SiO2 on c-Si(9L)
 
Thickness :        SiO2 (Top)-9L       76.462 nm
                            TiO2 – 8L        33.612 nm
                            SiO2 – 7L        120.040 nm
                            TiO2 - 6L         37.866 nm
                            SiO2 – 5L        195.399 nm
                            TiO2 – 4L        41.267 nm
                            SiO2 - 3L         368.989 nm
                            TiO2 – 2L        68.126 nm
                            SiO2 - 1L         360.651 nm
Substrate : Crystalline Silicon

  12-3. SiO2/Ti3O5/ SiO2/Ti3O5/ SiO2/Ti3O5/ SiO2 on TaF1(Glass)
 
Thickness : Ti3O5 : 38.869 nm
R.I : Dispersion of Ti3O5
Substrate : TaF1(Glass)
Layer 07(Top) :        SiO2       112.394 nm
Layer 06                    Ti3O5       38.869 nm
Layer 05                    SiO2        20.282 nm
Layer 04                    Ti3O5        40.198 nm
Layer 03                    SiO2         49.685 nm
Layer 02                    Ti3O5        15.084 nm
Layer 01                    SiO2         57.093 nm
Substrate              TaF1(Glass)

13. Color Filters (Red, Green, Blue)

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  13-1. Red on c_Si
 
  13-2. Green on c_Si
 
  13-3. Blue on c_Si
 

14. PHPS

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  14-1. PHPS on SiO2
 
Thickness : PHPS 21.158 nm
R.I. Dispersion of PHPS
Substrate : SiO2

15. Poly Siloxane

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  15-1. Poly Siloxane on c-Si
 
Thickness : P-S 145.589 nm
R.I. Dispersion of Poly siloxane
Substrate : Crystalline Silicon

16. CN

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  16-1. CN on c-Si
 
Thickness : CN 412.209 nm
R.I. Dispersion of CN
Substrate : Crystalline Silicon

17. BN

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  17-1. BN on c-Si
 
Thickness : BN 396.256 nm
R.I. Dispersion of BN
Substrate : Crystalline Silicon

18. BCN

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  18-1. BCN on c-Si
 
Thickness : BCN 506.746 nm
R.I. Dispersion of BCN
Substrate : Crystalline Silicon