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      |  | Analysis  of Optical Thin Films and Films on PET – A Few Examples (Ref: Ellipso Technology) | 
    
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            |  1. Reflectivity  of Camera Phone Lens : Effect of ARC | [TOP] |  | 
    
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      |  | Reflectivities of camera phone lens are compared.  The reflection spectra of lenses before they are anti-reflection coated(upper  middle), and after they are anti-reflection coated(upper right) are shown. 
 Thickness of ARC film is 58.4 nm. Reflectivity decreases from ~10 % to 2~4 %  after AR coating. Backside reflection from the opposite side of lens is  included.
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            |  2.  MgO-LiNbO3 / Epoxy on LiNbO3 | [TOP] |  | 
    
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                  | Thickness MgO-LiNbO3: 5995.43 nm
 Epoxy : 382.41 nm
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                  | R.I.(@633 nm) MgO-LiNbO3 : 2.206
 Epoxy : 1.7251
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                  | Substrate : LiNbO3 |  |  | 
    
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      |  | 3-1. Ag Doped TiO2 on Glass | 
    
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            | Thickness : 157.65 nm |  
            | Substrate : Glass |  
            | R.I. Dispersion |  | 
    
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      |  | 3-2. Co Doped TiO2 on Glass | 
    
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            | Thickness : 165.65 nm |  
            | Substrate : Glass |  
            | R.I. Dispersion |  | 
    
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      |  | 4-1. TiNx on Glass | 
    
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            | Thickness : TiNx 10.363 nm |  
            | Substrate : Glass |  
            | R.I. Dispersion of TiNx |  | 
    
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      |  | 5-1.Cr on Glass | 
    
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            | Thickness : Cr 32.091 nm |  
            | Substrate : Glass |  
            | R.I. Dispersion of Cr |  | 
    
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      |  | 6-1. NiO on c-Si | 
    
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            | Thickness : NiO 35.522 nm |  
            | Substrate : Crystalline Silicon |  
            | R.I. Dispersion of NiO |  | 
    
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      |  | 7-1. Primer on PET(Mitsubishi) | 
    
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            | Thickness : Primer 80.847 nm |  
            | Substrate : PET(Mitsubishi) |  
            | R.I. Dispersion of Primer |  | 
    
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      |  | 7-2. Primer on PET(Toyobo) | 
    
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            | Thickness : Primer 78.857  nm |  
            | Substrate : PET(Toyobo) |  
            | R.I. Dispersion of Primer |  | 
    
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      |  | 7-3. Primer on PET(Toyobo_low-Oligomer) | 
    
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            | Thickness : Primer 60.209   nm |  
            | Substrate : PET(Toyobo_Low-Oligomer) |  
            | R.I. Dispersion of Primer |  | 
    
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      |  | 8-1. Hard Coating/Primer on PET | 
    
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                  | Thickness of Film (From Top) : Hard Coating = 963.42 nm
 Primer = 58.38 nm
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                  | Substrate = PET |  |  |  | 
    
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      |  | 9-1. LR/HR on PET | 
    
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      |  | λ-min analysis technique and m-FFT analysis  technique are applied simultaneously to obtain thickness of LR and that of HR,  respectively, at the same time. LR(~100 nm) and HR(~μm) are  coated on PET. | 
    
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                  | LR  Thickness      113.0 nm |  
                  | HR  Thickness     1750.0 nm |  |  |  | 
    
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      |  | 10-1. Low RI/High RI/Hardcoating/Primer on PET | 
    
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            | Thickness : Low RI  16.336 nm High RI 54.397 nm
 Hardcoating 1721.137  nm
 Primer 100 nm
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            | Substrate : PET |  
            | R.I. Dispersion of Low RI / High RI |  | 
    
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            |  11.  Depth Profile of MgF2 AR Coating | [TOP] |  | 
    
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                  | Thickness of Film (From Top) P(Protection Layer)-Layer = 33.63 nm
 MgF2(55 %) + void(45 %) = 61.83 nm
 MgF2 (125 %) + void(-25 %) = 1109.9 nm
 Substrate : PET(94.6 %) + void(5.6 %)
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      |  | 12-1. AF/SiO2/SiN/SiO2/SiN/SiO2/SiN  on Glass | 
    
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            | Layers(From Top) : SiO2 (17.4%) + void(82.6%)       11.667 nm SiO2 (100%)                                  56.503 nm
 SiN (92.6%) + void(7.4%)           74.035 nm
 SiO2 (100%)                                  21.470 nm
 SiN (88.7%) + void(11.3%)         42.155 nm
 SiO2 (100%)                                  69.977 nm
 SiN (81.1%) + void(18.9%)         135.159 nm
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            | Substrate : Glass |  
            | R.I. Dispersion of SiO2(17.4%) AF Layer |  | 
    
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      |  | 12-2. SiO2/TiO2/SiO2/TiO2/SiO2/TiO2/SiO2/TiO2/SiO2 on c-Si(9L) | 
    
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            | Thickness :        SiO2 (Top)-9L       76.462 nm TiO2 – 8L        33.612 nm
 SiO2 – 7L        120.040 nm
 TiO2 - 6L         37.866 nm
 SiO2 – 5L        195.399 nm
 TiO2 – 4L        41.267 nm
 SiO2 - 3L         368.989 nm
 TiO2 – 2L        68.126 nm
 SiO2 - 1L         360.651 nm
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            | Substrate : Crystalline Silicon |  | 
    
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      |  | 12-3.  SiO2/Ti3O5/  SiO2/Ti3O5/  SiO2/Ti3O5/  SiO2 on TaF1(Glass) | 
    
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            | Thickness : Ti3O5 : 38.869 nm |  
            | R.I : Dispersion of Ti3O5 |  
            | Substrate : TaF1(Glass) |  
            | Layer 07(Top) :        SiO2       112.394 nm Layer 06                    Ti3O5       38.869 nm
 Layer 05                    SiO2        20.282 nm
 Layer 04                    Ti3O5        40.198 nm
 Layer 03                    SiO2         49.685 nm
 Layer 02                    Ti3O5        15.084 nm
 Layer 01                    SiO2         57.093 nm
 Substrate              TaF1(Glass)
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            |  13.  Color  Filters (Red, Green, Blue) | [TOP] |  | 
    
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      |  | 13-1.  Red on c_Si | 
    
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      |  | 13-2.  Green on c_Si | 
    
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      |  | 13-3.  Blue   on c_Si | 
    
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      |  | 14-1. PHPS on SiO2 | 
    
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            | Thickness : PHPS 21.158 nm |  
            | R.I. Dispersion of PHPS |  
            | Substrate : SiO2 |  | 
    
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      |  | 15-1. Poly Siloxane on c-Si | 
    
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            | Thickness : P-S 145.589 nm |  
            | R.I. Dispersion of Poly siloxane |  
            | Substrate : Crystalline Silicon |  | 
    
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      |  | 16-1. CN  on c-Si | 
    
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            | Thickness : CN 412.209 nm |  
            | R.I. Dispersion of CN |  
            | Substrate : Crystalline Silicon |  | 
    
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      |  | 17-1. BN on c-Si | 
    
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            | Thickness : BN 396.256 nm |  
            | R.I. Dispersion of BN |  
            | Substrate : Crystalline Silicon |  | 
    
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      |  | 18-1. BCN on c-Si | 
    
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            | Thickness : BCN 506.746  nm |  
            | R.I. Dispersion of BCN |  
            | Substrate : Crystalline Silicon |  | 
    
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